We shall exhibit at "MNC2015 - 28th International Microprocesses and Nanotechnology Conference"

Nano/Micro Processing Service
We offer the optimum material and processes to meet your specific need in prototyping as well as providing standard device of MEMS and microfluidcs.

• Substrate : Various material available, such as silicon, glass and polymer
• Deposition : Sputtering(120+kinds), evaporation, CVD, electro-plating and so on
• Lithography/Nano-imprinting : Contact aligner, stepper, EB and nano-imprinting
• Etching : Dry (ICP, RIE), wet and scarified etch and so on
• CMP/Bonding : CMP, bonding and other related process

Phase-shifting mask exposure system 'PhableR 100'
The PhableR100 tool provides unprecedented ability to print high resolution periodic structures in a low-cost photolithography system.

• High resolution below 300nm pitch
• 4" full-field exposure
• Non-contacted mask usable
• Suitable for non-flat substrate
• High uniformity below 3%
• Overlay alignment capability
• Available with commercial photoresist
• Conventional mask
• Frequency multiplication