We shall exhibit "26th FINETECH Japan" at MEMS Technology Zone

Mar. 4, 2016

We shall exhibit at "26th- FINETECH Japan" which will be held at Tokyo Big Sight during 6th (Wed) to 8th (Fri) of April, 2016.

Details are follows

Outline

Date April. 6th [Wed] - 8th[Fri], 2016
Venue Tokyo Big Sight East Hall
Booth NO

E43-15

Contents

[ M E M S ]
MEMS Device Volume Production (MEMS Foundry)

  • Partnership with Silex microsystems
  • Pure-Play MEMS foundry without in house manufactured products
  • Equipped φ6” and φ8” production line dedicated for MEMS.
    • == Platform technology to realizing high yields ==
      - TSV technology for high temperature and density with Sil-Via, all Si structure.
      - TSV technology for high yield by Cu hollow construction with Met-Via/Met-Cap
      - Established PZT thin film deposition with Sol-Gel method.
    • == "SmartBLOCK" to realize high cost-effectiveness ==
      - SmartBLOCK uses proven process blocks extracted from working process libraries to integrate functionality into a single structure. Faster more cost-efficient development through modular standardization using SmartBLOCK will support customers for timely product release.

[ Nanoimprint ]
Total solution with mold fabrication -imprinting services -related material supply

  • Mold fabrication (Nano〜Micro order mold)
  • Imprint process services (Introducing imprinting services results over 1000 cases including large size imprinting)
  • Suitable material offer for imprinting condition
  • Seamless RtR mold for mass production

Application of Micro/Fine structure and technology consulting

  • Anti-Reflection structure (Solar cell, Display etc.)
  • Hydrophobic structure (Window, Packing material for liquid etc.)
  • Anti-fogging structure (Bio technology etc.)
  • Droplet catch structure (flow controlling products)

Nanoimprinting Product

  • Schale with cell culture chip
  • Sapphire glass with anti-reflection structure
Contents

If you intend to visit the event, do not hesitate to stop by our booth.