Mask Aligners
Mask Aligners, UV Exposure Systems, UV Light Sources, UV power meter
About OAI
OAI is a Silicon Valley-based manufacturer of advanced precision equipment for the Solar, Photovoltaic, Semiconductor, MEMS, Microfluidics and Nanoimprinting industries, with over 40 years of experience. Cost-effective and extremely technical verified solution are the hallmark of OAI brand.
OAI understands that there is a critical difference between selling just machine and offering high-level functional solution for customer’s unique requirements. With this distinction in mind, the company has built its reputation by forming ongoing, collaborative customer relationships––the length of some is measured in decades. More than 1000 units of OAI systems are in use around the world.
Based upon its expertise in producing equipment, OAI has developed a time-tested platform of modularized subsystems, which can be adapted to become the core of a custom configured system. This approach controls cost, improves reliability, increases system flexibility, and ultimately reduces the overall cost of ownership.
We invite you to contact an OAI Solutions Engineer today and learn how we can solve your toughest manufacturing challenge efficiently and economically. From R&D tools to full production solutions, OAI will partner with your team every step of the way.
The company offers a broad portfolio of field-proven products that include Mask Aligners, UV Exposure Systems, UV Light Sources and UV power meter.
Bebefits
- Wide range of equipment from compact system for R&D to semi/full automatic system for volume production.
- Light source system is available independently.
- Based upon its expertise in producing equipment, OAI can supply cost-effective, reliable and expandable system by assembling modularized subsystems with time-tested and verified platform.
- Application of lithography, microfluidics, nanoimprinting, UV cure, solar cell and resistivity evaluation and so on.
Mask Aligner
- Mask aligner is the machine to transcribe fine pattern on substrate using UV light, is also called as mask alignment tool. Substrate uses various material, silicon, glass, ceramic, GaAs, quartz and so on. Though it is almost used on the manufacture of semiconductor device, such as general transistor and Integrated circuit,, it is used on LCD glass pattern and quartz crystal unit as well.
- OAI aligner is utilized for both purposes of R&D and production in the world. OAI products is garnering immense praise on the phase of reliability, durability and technical superiority, specially established reputation of good cost performance.
- This machine have also option to be graded-up with the function of ‘ microfluidics fabrication’ or ‘UV nano imprinting’ by adding controller and chucks.
- Suitable applications are semiconductor, display, MEMS, microfluidics, medical/bio and solar cells
Mask Aligner Lineup
| Model | Type | Application | Type of Alignment | Substrate Size | Operating Mode |
|---|---|---|---|---|---|
| Model200 | Manual single-side aligner | R&D | Single side | Up to Φ8" | Manual |
| Model200IR | IR double-side aligner | R&D | IR double-side | Up to Φ8" | Manual |
| Model800MBA | Semi-auto double-side aligner | R&D Production |
Optical double-side | Up to Φ8" | Semi-auto |
| Model6000 | Full-auto mask aligner | Production | Optical double-side | Up to Φ12" or 12"sq | Automatic |
| Model6000E | Aligner for large size format | R&D Production |
Single side | Up to 20" or 20" | Manual |
| Model2000 | Edge-bead exposure system | Production | Single side | Up to Φ8" | Automatic |
Model 200 : Manual single-side aligner for R&D
Model 200 table top mask aligner is a reasonable system intended for beginner users, such as universities, laboratories, or start-ups.
| Model | 200 |
|---|---|
| Substrate | Up to 8" square |
| Mask | Up to 9" square |
| Alignment Stage control |
XY movement : ±10mm Z movement : 1500µm Rotation : ± 3.5° |
| Alignment Tolerance |
- |
| Exposure Shutter time |
00.1s-99.0s (0.1sec increment）or 1s-999s (1sec increment) |
| Exposure Mode : Resolution |
Proximity : 5µm (20µm gap) Soft contact : 2µm Hard contact : 1µm Vacuum contact : sub-µm |
| Thoroughput | - |
| Ulitilities | Power :110V or 220V (depend on specs) Vacuum line, Air line or N2 line, Exhaust line |
| Size | 940mmH x 788mmW x 635mmD |
Model 200IR : IR double-side aligner for R&D
Function of IR double-side alignment is added to Model200.
Due to IR back-side alignment can be installed reasonably.
| Model | 200IR |
|---|---|
| Substrate Avaialble size |
Up to 8" square |
| Mask Avaialble size |
Up to 9" square |
| Alignment Stage control |
XY movement : ±10mm Z movement : 1500µm Rotation : ± 3.5° |
| Alignment Tolerance |
Front to bottom : <± 3µm (up to 250um thickness) <± 5µm (double side polished) |
| Exposure Shutter time |
0.1s-99.0s (0.1sec increment) or 1s to 999s (1sec increment) |
| Exposure Mode : Resolution |
Proximity : 5µm (20µm gap) Soft contact : 2µm Hard contact : 1µm Vacuum contact : sub-µm |
| Thoroughput | - |
| Ulitilities | Power : 220V Vacuum line, Air line or N2 line, Exhaust line |
| Size | 940mmH x 788mmW x 635mmD |
Model 800MBA : Semi-auto double-side aligner for R&D & Prodiction
The model 800 MBA has a double-side semi-auto alignment feature which consists on an optical system mounted on hard packages platform. It is possible to leave operation to this machine, which work with semi-auto mode.
This type is suitable to production besides R&D use due to which have the function of optical double-side alignment.
| Model | 800MBA |
|---|---|
| Substrate Avaialble size |
Up to 8" square |
| Mask Avaialble size |
Up to 9" square |
| Alignment Stage control |
XY movement : ±10mm Z movement : 3000µm Rotation : ±4° |
| Alignment Tolerance |
Single side : 0.5 to 1µm Double side: <2µm (3σ) |
| Exposure Shutter time |
1s to 3200s (0.1sec increment) |
| Exposure Mode : Resolution |
Soft contact : 2µm Hard contact : 1µm Vacuum contact : sub-µm |
| Thoroughput | - |
| Ulitilities | Power : 220V Vacuum line, Air line or N2 line, Exhaust line |
| Size | 1829mmH x 1270mmW x 813mmD |
Model 6000 : Full-auto mask aligner for Production
Model 6000 is a fully automatic computer controlled mask aligner with optical double side proximity contact exposure capability. Through-put is 180 wafers per hour. This type is suitable to semiconductor/MEMS production line. Good cost performance shows from R&D to middle-volume production on the small and medium enterprises as well as large cooperation.
| Model | 6000 |
|---|---|
| Substrate Avaialble size |
50mm to 200mm wafer/square or 200mm to 300mm wafer/square 100um to 7mm thickness up to 7mm to 10mm bent |
| Mask Avaialble size |
- |
| Alignment Stage control |
XY movement : ±6.5mm Z movement : 1500µm Rotation : ±5° |
| Alignment Tolerance |
Single side : 0.5µm (3σ) Double side : 1µm |
| Exposure Shutter time |
1s to 999s (0.1sec increment) |
| Exposure Mode : Resolution |
Proximity : 3µm(20µm gap) Soft contact : 1 tp 3µm Hard contact : 0.8 to 1µm Vacuum contact : 0.5 to 0.8µm |
| Thoroughput | 180 wafers/hour (1st mask) |
| Ulitilities | Power : 220V Vacuum line, Air line or N2 line, Exhaust line |
| Size | 1651mH x 2184mmW x 1364mmD |
Model6000E : Aligner for large size format for R&D & Production
Model 6000E is a mask aligner and exposure system intended for large size format. It is suitable for processing of FPD and other large substrates (max. 20"×20").
| Model | 6000E |
|---|---|
| Substrate Avaialble size |
Up to 500mm square |
| Mask Avaialble size |
- |
| Alignment Stage control |
- |
| Alignment Tolerance |
Single side : 0.5µm (3σ) |
| Exposure Shutter time |
1s to 999s (0.1sec increment) |
| Exposure Mode |
Proximity, Soft contact, Hard contact, Vacuum contact |
| Thoroughput | - |
| Ulitilities | Power : 400V Vacuum line, Air line or N2 line, Exhaust line |
| Size | 1905mH x 1422mmW x 1143mmD |
Model2000 : Edge-bead exposure system for Production
Model 2000 enables floodlighting exposure and edge bead exposure and is a fully automatic computer controlled system. It’s shadow mask technology makes production easy in case edge bead removal process is substantial.
| Model | 2000 |
|---|---|
| Substrate Avaialble size |
Up to12" square |
| Mask Avaialble size |
- |
| Alignment Stage control |
- |
| Alignment Tolerance |
- |
| Exposure Shutter time |
0.1s to 999s (0.1sec increment) |
| Exposure Mode : Resolution |
- |
| Thoroughput | - |
| Ulitilities | Power : 220V Vacuum line, Air line or N2 line, Exhaust line |
| Size | 1727mH x 1041mmW x 914mmD |
UV light source
- UV light source is the light source/ramp which illuminate with specified UV wavelength. OAI’s collimated UV light sources and UV exposure systems are available with Near, Mid, and Deep UV spectral outputs.
- As a leader in the production of stand alone UV light sources, OAI has used its years of optical technology experience to produce the highest quality mirror, lens coatings, uniformity, and design.
As a result, each UV light source is certified to meet the most demanding specifications. Additionally, the OAI UV light source is a module that can be integrated at a later date onto any OAI mask Aligner significantly reducing your future mask Aligner cost. Use an OAI UV power and energy meter to measure intensity and uniformity of the UV light source.
UV Light Meters & Radiometers
| Model | Type | Beam size | output spectra range | output power range | shutter timer range | |
|---|---|---|---|---|---|---|
| Model 30 | UV light source | 2" - 12" | 220-450nm | 200-5kW | 0.1-999s | Standard type |
| Model 30E | Enhanced UV light source | 2" - 12" | 220-450nm | 200-5kW | 0.1-999s | With a pull-out drawer with a rotating chuck |
| Model 30 Grande | Large area collimated UV light source | 12" - 1m | 220-450nm | 200-5kW | 0.1-999s | Larger scale applications |
UV light source Series30 : Atand alone type
Series30 is high efficient light source intended for various applications. Multiple and suitable beam-size can be chosen by being capable to mount various lamp.
UV power meter
- UV power meter is equipment for the measurement of various parameters in UV light. Power meter, radio meter and energy analyzer are chosen according to measurement parameter.
- OAI UV parameter have following features.
・RoHS and CE Compliant
・Detachable single or dual wavelength probes
・Auto ranging, digital display
・Light intensity measured in milliwatts/cm2
・Accuracy is traceable to NIST
・High speed serial port for data logging
UV Light Line-Up
UV Light Meters & Radiometers
| model | Type | Spectral response | Intensity range | accuracy |
|---|---|---|---|---|
| Model308 | Handheld UV light meter | 200nm - 540nm | 0 - 1999 mW/cm2 | ±3% |
| Model308DH | Handheld UV light meter with data logger | 200nm - 540nm | 0 - 1999 mW/cm2 | ±3% |
| Model308HI | Handheld UV Light Meter with High Intensity Probe | 200nm - 540nm | 2000 - 7500 mW/cm2 | ±3% |
UV Intensity & Energy Light Meters
| model | Application | Spectral response | energy range | Intensity range | accuracy |
|---|---|---|---|---|---|
| Model311 | contact/proximity aligners and other exposure sources | DUV,MIDUV,NUV | 0 - 199.9 mj | 2 - 400 mW/cm2 | ±3% |
| Model316 | Perkin-Elmer projection aligner 100, 200,300 | NUV | 0.1 - 1000 mj | 0.1 - 1000 mW/cm2 | ±3% |
| Model317 | SVGL(ASML), Perkin-Elmer projection aligner | MIDUV,NUV | 0 - 9999 mj | 16 - 1600mW/cm2 | ±3% |
| Model356 | contact/proximity aligners and other exposure sources | DUV,MIDUV,NUV | 0 - 9999 mj | 0.1 - 400 mW/cm2 | ±3% |
| Model357/457 | ASML, GCA Nikon, Canon stepper | 365,400,420,436nm | 0 - 9999 mj | 16 - 1600mW/cm2 | ±1.5%(NB),±3%(NB) |
| Model358/458 | ASML, GCA Nikon, Canon stepper | 365,400,420,436nm | 0 - 9999 mj | 40 - 4000mW/cm2 | ±1.5%(NB),±3%(NB) |
| Model459 | Ultratech stepper | 365,400,420,436nm | 0 - 9999 mj | to 6000mW/cm2 | ±3% |
Calibration Services
For over 40 years, OAI is the leader in NIST traceable calibration of instruments for measuring Ultra Violet (UV) light. Originally designed to meet the demanding needs of the semiconductor wafer fabrication industry, OAI developed the most repeatable NIST traceable calibration in the industry. Today, virtually every semiconductor wafer manufacturing facility in the United States and a significant number around the world use OAI as the standard instrumentation for UV light measurement. In addition to offering the guaranteed calibration accuracy described above, OAI strives for efficient quick calibration turnaround for users of its services.
Kyodo international Inc. is the authorized distributor of OAI.
It enables simplification of the trading business procedure on this calibration service.
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| 製品分類1 | Microfabrication Tools |
|---|---|
| 製品分類2 | Mask aligner |
| プロセス分類 | Process & Equipment |
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