All plastic versatile Spin processor
All plastic versatile Spin processor "POLOS "
"POLOS™" manufactured by SPS is a spin processor with all plastic design, brushless motor equipped and many options and expandability available.

The versatile, all plastic, POLOS™ and SPIN150™ single substrate spin processors are specifically designed for applications for MEMS, R&D and typically low volume applications. Spin developing, spin etching, rinse / cleaning, spin drying.
Benefits
- Full plastic systems;
- Easy to use = It can be easily cleaned.
- Can be used for multiple processes: etching, development, spin-dry, etc.
- Chemical inert (Polypropylene, Teflon).
- Use of brushless motor
- Rotation of heavy substrates works flawlessly.
- Acceleration/ Backwards rotation/ no rotation values settable.
- Rotation speed up to 10000rpm. Coating with high viscosity material also possible
- Many options and expandability available
- availableSubstrate dimensions from chip size up to 1000×1000mm can be handled.
- Various line-ups of choices for many applications
* Dispense type: manual / automatic
* Desktop type / OEM type
* All inclusive system "Mini Wet Station" - Wide choice available for fixing the substrate (ex. Vacuum chuck, Mechanical chuck, etc.)
- Many customizations available for pumps, tanks, feed back systems for external apparatus, etc.

All plastic versatile Spin processor POLOS Line-up
Specifications | Applications | |||||||||
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Model | Description | Substrate and Size | Dry | Rinse | Cleaning | Etching | Development | Coating Manual |
Coating Automatic |
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Manual | Spin150i Desktop Spin150i -INT Built-in |
Basic model -3 output connecters (i.e.: Dispense unit, N2 diffuser etc.) -Output connecter enables to be used as an Automatic dispens |
Up to φ160mm (or 6”) or 4”x4” | ○ | ○ | ○ | ○ | ○ | ○ | - |
Manual | Spin200i Desktop Spin200i-INT Built-in |
Basic model -3 output connecters (i.e.: Dispense unit, N2 diffuser etc.) -Output connecter enables to be used as an Automatic dispens |
Up to φ260mm (or 8”) or 6”x6” | ○ | ○ | ○ | ○ | ○ | ○ | - |
Automatic | POLOS200i-ADV Desktop POLOS200i-ADV-INT Built-in |
Advanced model -Infinite I/O control by LAN connection -High torque robust motors for heavy substrates or high speed -System integrated solutions available on request |
Up to φ260mm(or 8”) or 6”x6” | ○ | ○ | ○ | ○ | ○ | - | ○ |
Automatic | POLOS300i-ADV Desktop POLOS300i-ADV-INT Built-in |
Advanced model -Infinite I/O control by LAN connection -High torque robust motors for heavy substrates or high speed -System integrated solutions available on request |
Up to φ360mm(or 12”) or 8”x8” | ○ | ○ | ○ | ○ | ○ | - | ○ |
*Up to 1000mm square substrates can be applied as an option
All plastic versatile Spin processor POLOS common characteristics
Chamber Material | -NPP (Standard) or PTFE (Optional) A seamless chamber structure by chemical-resistant polypropylene (Teflon as an option). Easy to clean. |
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Control Panel | -Touch panel operation. Detachable Operable with glove. Suitable for use in glove box. |
Program | -Unlimited programs and storage capacity* -Minimum step time ±0.1sec. External PC is unnecessary *USB, PC software etc. are possible by adding standard unit. |
Data Port | USB |
Included Substrate Holder | -Standard Vacuum Chuck -Small adapter forφ 1/2“- φ 2’’ (Various holders are available optionally) |
Rotating Speed | -Up to 12000rpm (150 or 200 series) -Up to 10000rpm (300 series) Clockwise, Anticlockwise, Paddle action |
Acceleration | 0-3000 rpm/sec |
Rotating Accuracy | ±1rpm |
Power Supply | 100–120VAC, 50/60Hz, 2.5A |
Power Consumption | 500W (max) |
All included system "Mini Wet Station"

By integrating Spin processor and high accuracy chemicals supply system in one body, it is possible to set up multiple processes in a single program. Chemical sharing system, liquid disposal system and ventilation system are mounted in a cabinet with sensor-monitored alarm system, guarantees safety in operation. Spin processor applies materials (PP, PTFE, etc.) which offer the same superior chemical inertness as other models.
Feature
Substrate | 300mm mm model (Can handle substrate up to Φ260mm) Φ400mm model (Can handle substrate up to Φ360mm) Customized Spin Processor can handle substrates up to 600mm×600mm. |
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Chamber Materials | PP, PTFE (TFM1600), PFA, ECTFE |
Motor | - Standard type 1 - 10,000rpm, clock-wise rotation, in case of φ8" substrate, acceleration is 2,000rpm/s. - Heavy duty type 1 - 10,000rpm, clock-wise and reverse clock-wise rotation, in case of Φ8" substrate, acceleration is 2,000rpm/s. Selectable from above. For more information about motor types, please contact us |
Main Option | Linear drive chemicals delivered arm, chemicals delivery nozzle / line expansions, mega sonic cleaning. Recirculation possible Chemical supply, ventilation system, high pressure jet, supplied chemical temperature control, spray nozzle to be attached on the back or central side ( for example, for edge bead removal etc.), various chuck (300 types such as vacuum, mechanical, backside protection etc.), Safety interlock. |
*Up to 1000mm square substrates can be applied as an option
POLOS Chucks
Vacuum chuck for small size substrates |
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Mechanical chuck |
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Mechanical chuck for squared substrates
(Mask, Crystal cells) |
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Other vacuum chucks for different substrates shapes and sizes |
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Vacuum chuck for circular substrates (Φ2" –Φ300") | ![]() |
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For circular substrate (Vacuum chuck + centering pin) | ![]() |
Mechanical chuck for squared substrates (Φ2", Φ3", Φ4") | ![]() |
Other mechanical chucks (Please ask for more information) | ![]() |
Chemical Compatibility Chart
[Reference Information]
Chamber material :NPP(Natural Poly Propylene)as a standard or PTFE as an option ◯:Usable -:Unusable ▲:Ask before use as it may cause destruction depend on conditions
Acetic acid | Formula | NPP | PTFE |
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Acetic acid | C2H2O2 | ○ | ○ |
Acetone | C3H6O | ○ | ○ |
α-terpineol | C10H18O | ○ | ○ |
Ammonium hydroxide | NH4OH | ○ | ○ |
Amyl chloride | C5H11Cl | - | ○ |
Methoxybenzene | C7H8O | ○ | ○ |
Benzene | C6H6 | - | ○ |
Bromine | Br | - | ▲ |
Chlorobenzene | C6H5OI | ○ | ○ |
Chloroform | CHCl3 | ○ | ○ |
Diethyl ketone | C5H10O | ○ | ○ |
Dimethyl malonate | C11H20O4 | ○ | ○ |
Ethylene glycol | C2H6O2 | ○ | ○ |
Cyclohexane | C6H12 | - | ○ |
Cyclohexanone | C6H10O | - | ○ |
Fluorine | F2 | - | - |
Hexamethyldisilazane | C6H19NSi2 | ○ | ○ |
Hexane | C6H14 | ○ | ○ |
Oxalic acid | HBr | ▲ | ▲ |
Hydrochloric acid | HCI | ▲ | ▲ |
Hydrofluoric acid | HF | ▲ | ▲ |
Hydrogen peroxide solution | H2O2 | ○ | ○ |
Iodine | I2 | ○ | ○ |
Isopropyl alcohol (IPA) | C3H8O | ○ | ○ |
Trimethylbenzene | C9H12 | ○ | ○ |
Ozone water | O3 & H2O | ○ | ○ |
Methanol | CH4O | ○ | ○ |
Methyl ethyl ketone (MEK) | C4H8O | ○ | ○ |
Methylene chloride | CH2CI2 | ○ | ○ |
Methyl isobutyl ketone (MIK) | C6H12O | ○ | ○ |
N-Methyl-2-Pyrolidone (NMP) | C5H9NO3 | ○ | ○ |
Nitric acid | HNO3 | ▲ | ○ |
Phosphoric acid | H3O4P | ○ | ○ |
Photoresist | - | ○ | ○ |
Polymethylmethacrylate (PMMA) | C5H8O2 | ○ | ○ |
Potassium hydrate | KOH | ○ | ○ |
Sulfuric acid | H2SO4 | ▲ | ▲ |
Tetra hydro furane (THF) | C4H8O | ○ | ○ |
Toluene | C7H8 | ○ | ○ |
Trichloroethane (TCA) | C2H3CI3 | ○ | ○ |
Trichlorethylene (TCE) | C2HCI3 | ○ | ○ |
Xylene | C12H15O6 | ○ | ○ |
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製品分類1 | Microfabrication Tools |
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製品分類2 | Spin Processor |
プロセス分類 | Process & Equipment |
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